Publications and Patents
R. R. Mett and J.S. Hyde, "Aqueous flat cells perpendicular to the electric field for use in electron paramagnetic resonance spectroscopy," J. Magn. Reson. 165, 137-52 (2003).
R. R. Mett, H. Noorbakhsh, and R. D. Greenway, Assignee Applied Materials, Inc., U. S. Patent #6,500,299, "Chamber having improved gas feed-through and method," December 31, 2002.
J. S. Hyde, R. R. Mett, and J. R. Anderson, "Cavities with axially uniform fields for use in electron paramagnetic resonance.III.Re-entrant geometries," Rev. Sci. Instrum. 73, 4003-9 (2002).
J. R. Anderson, R. R. Mett, and J. S. Hyde, "Cavities with axially uniform fields for use in electron paramagnetic resonance.II.Free space generalization," Rev. Sci. Instrum. 73, 3027-37 (2002).
J. S. Hyde and R. R. Mett, "Aqueous sample considerations in uniform field resonators for electron paramagnetic resonance spectroscopy," Current Topics inBiophysics 26, 7-14 (2002).
R. R. Mett, W. Froncisz, and J. S. Hyde, "Axially uniform resonant cavity modes for potential use in electron paramagnetic resonance spectroscopy," Rev. Sci. Instrum. 72, 4188-200 (2001).
R. R. Mett and S. Salimian, Assignee Applied Materials, Inc., U. S. Patent #6,304,424, "Method and apparatus for minimizing plasma destabilization within a semiconductor wafer processing system," October 16, 2001.
W. N. Taylor, R. R. Mett, and M. W. Curry, Assignee Applied Materials, Inc., U. S. Patent #6,273,736, "Safety guard for an RF connector," August 14, 2001.
B. Y. Pu, H. Shan, C. Björkman, K. Doan, M. Welch, and R. R. Mett, Assignee Applied Materials, Inc., U. S. Patent #6,273,022, "Distributed inductively-coupled plasma source," August 14, 2001.
H. Shan, C. H. Björkman, P. Luscher, R. R.Mett, and M. Welch, Assignee Applied Materials, Inc., U. S. Patent #6,232,236, "Apparatus and method for controlling plasma uniformity in a semiconductor wafer processing system," May 15, 2001.
M. Dahimene, R. R. Mett, and S. Salimian, Assignee Applied Materials, Inc., U. S. Patent #6,198,616, "Method and apparatus for supplying a chucking voltage to an electrostatic chuck within a semiconductor wafer processing system," March 6, 2001.
R. R. Mett, S. Salimian, and M. G. McNeal, Assignee Applied Materials, Inc., U. S. Patent #6,005,376, "DC power supply," December 21, 1999.
K. -H. Ke, R. A. Lindley, H. Shan, and R. R. Mett, Assignee Applied Materials, Inc., U. S. Patent #5,989,349, "Diagnostic pedestal assembly for a semiconductor wafer processing system," November 23, 1999.
R. R. Mett, R. D. Greenway, G. Bilek, and A. Joshi, Assignee Applied Materials, Inc., U. S. Patent #5,952,896 "Impedance matching network," September 14, 1999.
R. A. Lindley, C. H. Björkman, H. Shan, K. -H. Ke, K. Doan, R. R. Mett, and M. Welch, "Magnetic field optimization in a dielectric magnetically enhanced reactive ion etch reactor to produce an instantaneously uniform plasma," J. Vac. Sci. Technol. A 16, 1600-3 (1998).
R. R. Mett, M. Dahimene, S. Salimian, P. E. Luscher, and M. S. Contreras, Assignee Applied Materials, Inc., U. S. Patent #5,737,177 "Apparatus and method for actively controlling the DC potential of a cathode pedestal," April 7, 1998.
H. L. Berk, B. N. Breizman, S. M. Mahajan, M. S. Pekker, J. W. Van Dam, H. V. Wong, D. Borba, S. E. Sharapov, J. Candy, M. S. Chu, R. R. Mett, and M. N. Rosenbluth, "Alfvén wave interaction with energetic alpha particles," in Proceedings of the Fifteenth International Conference on Plasma Physics and Controlled Nuclear Fusion Research, Seville, Spain, 1994 (International Atomic Energy Agency, Vienna, 1995).
R. R. Mett, E. J. Strait, and S. M. Mahajan, "Damping of toroidal Alfvén modes in DIII-D," Phys. Plasmas 1, 3277-87 (1994).
H. L. Berk, R. R. Mett, and D. M. Lindberg, "Arbitrary mode number boundary layer theory for non-ideal toroidal Alfvén modes," Phys. Fluids B 5, 3969-96 (1993).
M. S. Chu, A. D. Turnbull, J. M. Greene, L. L. Lao, M. S. Chance, H. L. Berk, B. N. Breizman, W. Q. Li, D. M. Lindberg, S. M. Mahajan, R. R. Mett, D. W. Ross, J. W. Van Dam, J. C. Wiley, H. Ye, J. Candy, and M. N. Rosenbluth, "Theory of toroidicity-induced Alfvén eigenmodes in a finite-b arbitrary cross-section tokamak and analysis of nonideal effects, stability thresholds, and nonlinear behavior," in Proceedings of the Fourteenth International Conference on Plasma Physics and Controlled Nuclear Fusion Research, Würzburg, Germany, 1992 (International Atomic Energy Agency, Vienna, 1993), Vol. II, p. 71.
R. R. Mett and S. M. Mahajan, "Kinetic theory of toroidicity and ellipticity-induced Alfvén eigenmodes," in Theory of Fusion Plasmas, Proceedings of the Joint Varenna-Lausanne International Workshop, Varenna, Italy, 1992, edited by J. Vaclavik, F. Troyon, and E. Sindoni (Editrice Compositori Società Italiana di Fisica, Bologna, 1992), pp. 243-56.
R. R. Mett and S. M. Mahajan, "Kinetic theory of toroidicity-induced Alfvén eigenmodes," Phys. Fluids B 4, 2885-93 (1992).
R. R. Mett, "Kinetic theory of RF current drive and helicity injection," Phys. Fluids B 4, 225-31 (1992).
R. R. Mett and J. B. Taylor, "Steady-state dynamo and current drive in a nonuniform bounded plasma," Phys. Fluids B 4, 73-8 (1992).
R. R. Mett and J. A. Tataronis, "Current drive via injection of wave helicity," in Theory of Fusion Plasmas, Proceedings of the Joint Varenna-Lausanne International Workshop, Varenna, Italy, 1990, edited by J. Vaclavik, F. Troyon, and E. Sindoni (Editrice Compositori Società Italiana di Fisica, Bologna, 1990), pp. 453-60.
R. R. Mett and J. A. Tataronis, "Current drive via magnetohydrodynamic helicity waves in a nonuniform plasma," Phys. Fluids B 2, 2334-45 (1990).
R. R. Mett and J. A. Tataronis, "Current drive via magnetohydrodynamic helicity waves," Phys. Rev. Lett. 63, 1380-3 (1989).
R. R. Mett and J. A. Tataronis, "RF current drive and helicity injection," in Eighth Topical Conference on Radio-Frequency Power in Plasmas, edited by Roger McWilliams, AIP Conference Proceedings 190 (AIP, New York, 1989), pp. 446-9.
R. R. Mett, S. W. Lam, and J. E. Scharer, "Experimental investigation of a probe-induced localized electron temperature elevation near electron cyclotron resonance," IEEE Trans. Plasma Science 17, 818-27 (1989).
R. R. Mett, S. W. Lam, and J. E. Scharer, "Experimental investigation of a localized electron temperature spike produced by collisionless electron cyclotron damping," in Seventh Topical Conference on Application of Radio-Frequency Power to Plasmas, edited by S. Bernabei and R. W. Motley, AIP Conference Proceedings 159 (AIP, New York, 1987), pp. 17-20.
A. Molvik, W. Cummins, S. Falabella, P. Poulsen, J. Barter, G. Dimonte, T. Romesser, and R. Mett, "ICRF heating in the tandem mirror experiment-upgrade (TMX-U)," in Proceedings of the Fourth International Symposium on Heating in Toroidal Plasmas, edited by H. Knoepfel and E. Sindoni, (International School of Plasma Physics, Rome, Italy, 1984), Vol. II, pp. 433-8.